Hydrogen-related defects and oxygen vacancies in silica are analyzed using first-principles density functional calculations. Energetics, structures, charge-state levels, and hyperfine parameters are determined. These calculations identify the hydrogen bridge related to the E'(4) center as the defect responsible for the stress-induced leakage current, a forerunner of dielectric breakdown of gate oxides in transistors.
By: Peter B. Bloechl
Published in: Physical Review B, volume 62, (no 10), pages in 2000
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