Amorphous and Microcrystalline n+ Silicon Thin Film Deposited By Plasma Enhanced Chemical Vapor Deposition

        No Abstract Available.

By: Yue Kuo

Published in: RC20920 in 1997

This Research Report is not available electronically. Please request a copy from the contact listed below. IBM employees should contact ITIRC for a copy.

Questions about this service can be mailed to .