The efficient lithography of diffractive optical elements requires the pattern data to be optimized in terms of size and of the fidelity with which it approximates the design. We describe a hardware and software package that provides direct support for curved patterns, rather than resorting to an approximation by polygons, and that can be implemented to enhance existing electron-beam lithography tools. The method employed allows surfaces bounded by conic sections to be approached to the best possible accuracy, and substantially reduces the pattern file size.
By: H. Rothuizen, D. Prongue, F. Vasey and P. Vettiger
Published in: Microelectronic Engineering, volume 34, (no 3-4), pages 243-60 in 1997
Please obtain a copy of this paper from your local library. IBM cannot distribute this paper externally.
Questions about this service can be mailed to reports@us.ibm.com .