Germanium and carbon based films have been deposited by plasma enhanced chemical
vapor deposition (PECVD) from tetramethylgermane (TMGe) with additions of oxygen,
hydrogen or argon. The index of refraction, extinction coefficient and optical gap and FTIR
spectra of the films have been measured as well as their stability in regular ambiance. It was
found that the films deposited from pure TMGe were stable in time only if deposited at a
negative bias above -250 V DC. Films deposited at a bias of -150 VDC could be stabilized by
significant additions of oxygen to the plasma and complete stabilization was achieved at
O2/TMGe ratios larger then 3 in the gas feed. Additions of hydrogen or argon to TMGe had only
slight effects in improving the stability off the films.
By: Alfred Grill, S. Guilley, Vishnubhai V. Patel, Katherina Babich
Published in: RC22052 in 2001
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