Physical and Electrical Characterization of Hafnium Oxide and Hafnium Silicate Sputtered Films

Copyright © (2001) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics

By: A. Callegari, E. Cartier, M. Gribelyuk, H. F. Okorn-Schmidt, T. Zabel

Published in: Journal of Applied Physics, volume 90, (no 12), pages 6466-75 in 2001

Please obtain a copy of this paper from your local library. IBM cannot distribute this paper externally.

Questions about this service can be mailed to reports@us.ibm.com .