We illustrate the propagation of light in a new type of coupling mask for lensless optical lithography. Our investigation shows how the different elements comprising such masks contribute to the definition of an optical path that allows the exposure of features in the 100-nm-size range in the photoresist.
By: Olivier J. F. Martin, Nicolas B. Piller, Heinz Schmid, Hans Biebuyck and Bruno Michel
Published in: Optics Express, volume 3, (no 7), pages 280-5 in 1998
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