PECVD SiO(x)N(y) waveguides on SiO(2)-cladded Si substrates were fabricated with an effective refractive-index contrast of approximately 0.02. After annealing, an optical propagation loss of 0.10 dBcm is measured in the wavelength window of 1540-1580 nm using prism coupling. Systematic evaluation is done as a function of PECVD process conditions, and a comparison of as-grown and annealed films is made. Single-mode waveguide channels with a lateral width of 3 um are made using RIE, and subsequently overgrown with SiO(2) by PECVD. Curved waveguide segments with bending radii down to 1 mm are optimized for low-loss transmission.
By: I. Massarek, B. J. Offrein, G. L. Bona, R. Germann and H. W. M. Salemink
Published in: RZ2821 in 1996
LIMITED DISTRIBUTION NOTICE:
This Research Report is available. This report has been submitted for publication outside of IBM and will probably be copyrighted if accepted for publication. It has been issued as a Research Report for early dissemination of its contents. In view of the transfer of copyright to the outside publisher, its distribution outside of IBM prior to publication should be limited to peer communications and specific requests. After outside publication, requests should be filled only by reprints or legally obtained copies of the article (e.g., payment of royalties). I have read and understand this notice and am a member of the scientific community outside or inside of IBM seeking a single copy only.
Questions about this service can be mailed to reports@us.ibm.com .