Performance enhancement in successive CMOS technology generations in the past was driven by device scaling and lithography. In the 90s, however, new materials and device structures became the key enablers for CMOS performance enhancement (in conjunction with scaling). Figure 1 lists the key performance enablers for various generations of CMOS technology from the past to the present.
By: D. K. Sadana; S. Koester; Y. Sun; E. Kiewra; S. W. Bedell; A. Reznicek; H. J. Hovel; J. Ott; K. Fogel; D. J. Webb; J. Fompeyrine; J.-P. Locquet; M. Sousa; R. Germann
Published in: RC23932 in 2006
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