Copyright © (2014) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics
We describe a nanostencil lithography tool capable of operating at variable temperatures down to 30 K. The setup is compatible with a combined low-temperature scanning tunneling microscope/atomic force microscope (LT STM/AFM) located within the same ultra-high-vacuum apparatus. The lateral movement capability of the mask allows the patterning of complex structures. To demonstrate operational functionality of the tool and estimate temperature drift and blurring, we fabricated LiF and NaCl nanostructures on Cu(111) at 77 K.
By: Wolfram Steurer, Leo Gross, Reto R. Schlittler, and Gerhard Meyer
Published in: Review of Scientific Instruments, volume 85, (no ), pages 023706 in 2014
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