PIXE (Particle induced X-Ray emission) is a highly sensitive element specific analytical technique for surfaces and thin films. A new PIXE spectrometer has been installed and calibrated at the IBM - Almaden Ion Beam Laboratory. Its performance has been optimized for elements in the region 15<Z<35, specifically addressing the elements of greatest interest for magnetic storage technology and research. The system and its performance are fully described. ONe significant advantage is gained by correlated analysis using both PIXE and RBS on one sample. The application of such analysis for a spin=valve-like multilayered thin film is discussed.
By: Manfredo H. Tabacniks, Andrew J. Kellock and John E. E. Baglin
Published in: RJ10000 in 1996
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