Very Narrow SiGe/Si Quantum Wells Deposited By Low Temperature Atmospheric Pressure Chemical Vapor Deposition

Copyright © (1993) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics

By: Detlev A. Gruetzmacher, T. O. Sedgwick, G. A,. Northrop, A. R. Powell, V. P. Kesan

Published in: Journal of Vacuum Science and Technology B, volume 11, (no 3), pages 1083-1088 in 1993

Please obtain a copy of this paper from your local library. IBM cannot distribute this paper externally.

Questions about this service can be mailed to reports@us.ibm.com .